Izixhobo zePlasma ze-LED zeRF

I-LCD RF Plasma Equipment iyilelwe ngokukodwa ukunyangwa komphezulu wamacandelo ekristale elulwelo kunye nemathiriyeli yombane enxulumeneyo. Imilinganiselo yomatshini jikelele yi-900W × 1750H × 1200D (mm). Igumbi layo le-vacuum, elakhiwe kwintsimbi engapheliyo, lilinganisa i-450 × 300 × 450 mm kwaye lihlala ukuya kwiitreyi ezintandathu ezifakwe kwibhetshi enye. Olu qwalaselo luvumela inkqubo ukuba ixhase zombini -imifuniselo yesikali kunye{10}}nomthamo ophezulu wemveliso yemveliso.

 

Kwimbono yokusebenza, isixhobo sidibanisa{0}umgangatho ophezulu wezinto zombane ezithathwe kwiibrendi ezivunyiweyo kumazwe ngamazwe, ziqinisekisa{1}}uzinzo lokusebenza kwexesha elide. Inkqubo ibonelela ngeendlela zombini kunye neendlela ezizenzekelayo, ezivumela ukuguquguquka ekusebenzeni. Amanqanaba amathathu -isakhiwo solawulo lwegunya{5}eligquma umsebenzisi, injineli, kunye nofikelelo oluphezulu lomsebenzisi{6}} luqinisekisa imveliso ekhuselekileyo kwaye lunqanda uhlengahlengiso olungagunyaziswanga. Ukulandelela imveliso, umatshini ubonisa inkqubo yokunika ingxelo edibeneyo, ukurekhoda ngokuzenzekelayo kunye nokuxhasa idatha yenkqubo rhoqo ngenyanga. Abasebenzisi banokugcina kwaye bakhumbule inani elingenamkhawulo weeresiphi zenkqubo, ukubonelela ngokulungelelanisa ngokufanelekileyo kwiimveliso ezahlukeneyo kunye nezicelo.

Ulungelelwaniso lwenkqubo engundoqo luthatha imibhobho yentsimbi engenasiphene kunye nemivumbo, kunye neevalvu zevacuum ze-GDQ ezilungiselelweyo zolawulo olusebenzayo lokukhupha. Umlinganiselo we-vacuum wenziwa yi-Pirani resistance vacuum gauge, eqinisekisa ukufundwa okuchanekileyo kunye nokuzinza. -Ivalve yesango evacuum ephezulu ibandakanyiwe ukulungiselela ukwahlulwa kwegumbi. Inkqubo yokulawula ixhomekeke kwi-Mitsubishi PLC kunye neemodyuli zokwandisa, ukuhambisa ulawulo lwepharamitha yenkqubo echanekileyo kunye nethembekileyo.

Ngokweenkcukacha zobugcisa, izixhobo zibonelela ngeziteshi ezintathu zegesi, i-nitrogen exhasayo (N₂), i-argon (Ar), i-hydrogen (H₂), kunye ne-oxygen (O₂). Inqanaba le-vacuum lilawulwa phakathi kwe-10-50 Pa, kunye nokuguquguquka koxinzelelo olugcinwe ngaphakathi kwe-5%. Amazinga okuhamba kwegesi anokulungelelaniswa phakathi koluhlu lwe-0-200 sccm. Ukupholisa initrogen, umoya ocinezelweyo, kunye nenkqubo yojongano lwegesi isebenza ngokukhuselekileyo kwi-0.45 MPa okanye ngaphantsi. Imowudi yonyango ye-plasma yi-plasma ngqo, kunye ne-anode etshintshanayo kunye ne-cathode electrode. Phakathi kwamaqela amabini kunye namane e-electrode anokufakwa ngaxeshanye. I-electrode nganye inommandla osebenzayo we-380 × 310 mm, kwaye isithuba phakathi kwe-electrode iyalungiswa, kunye noluhlu oluqhelekileyo lwe-2.5 cm.

Kwizicelo zamashishini, esi sixhobo sibaluleke kakhulu ekucoceni umphezulu ngaphambi kweenkqubo ze-encapsulation (molding). Unyango lwe-plasma lususa ukungcola kwezinto eziphilayo kwaye lusebenze indawo engaphantsi komhlaba, ngokufanelekileyo ukwandisa indawo yoqhagamshelwano kunye namandla okubambelela. Oku kuthintela i-delamination okanye ukwahlukana ngexesha lokubumba kwaye kunegalelo ekuthembekeni okuphezulu kwemveliso. Ngoyilo lwayo olomeleleyo, imisebenzi yolawulo oluphezulu, kunye nokusebenza kwenkqubo echanekileyo, inkqubo inikezela ngeziphumo ezingaguquguqukiyo, eziphindaphindwayo zonyango lweplasma, iyenza ibe sisisombululo esifanelekileyo sokwenziwa kwephaneli yeLCD kunye nezicelo zokupakisha zesemiconductor.

Iifayile ezishisayo: Izixhobo ze-plasma ezikhokeleyo, iTshayina iholele abavelisi bezixhobo zeplasma, umzi-mveliso